Mask Submission Procedure
Britton Plourde 1/98 (Updated by Sergey Frolov  6/04)

(1) Design pattern using LASI

 (2) Create .TLC file in LASI

(3) Create .GDS file

 (4) Transfer .GDS files to  isis.micro.uiuc.edu  (or 'ISIS', the Alpha machine at Microelectronics)

 (5) Convert .GDS files using CPRX on ‘ISIS’

(6) Check conversion results

 (7) Layout mask

 (8) Write job file

  • MEX - defines location of ref. square for the current pattern. Make sure coordinates are consistent, e.g. coarse and fine files for a given pattern layer should be mexed to the same point.
    EXI
    - sets stepping distances for writing an array consisting of repetitions of a single pattern.
    EXN
    - defines number of steps corresponding to EXI command.
  • When writing arrays, consider that only the basic pattern gets processed by CPRX. So if proximity correction is used, CPRX will think that the edges of the basic pattern are true edges and will increase doses there. But these edges will in fact join up with the next cell in the array, i.e. another repetition of the same pattern. This could lead to overexposure at the junctions of the array cells.
  • Transfer .JOB file to ISIS (isis.micro.uiuc.edu) using ftp in ASCII mode. ***
  •  (9) Submit a job request form to John Hughes

     (10) Problems or questions, ask:

    (11) Good luck!